1	37	41	6937	T. Matsumura	dummy	0	2008/2/1/19:24:29(172.16.44.137)	Ru
4	27	35	6937	T. Matsumura	dummy	0	2008/2/4/12:34:58(130.34.95.43)	Ru
4	36	44	6936	kawai	dummy	0	2008/2/4/19:9:54(130.34.95.43)	Reactive sputter Ru with O2 for RuO2
5	22	30	6937	T. Matsumura	dummy	0	2008/2/5/10:25:17(130.34.95.43)	Ru @150C
5	30	38	6937	T. Matsumura	dummy	0	2008/2/5/14:35:26(130.34.95.43)	Ru @ 150C
5	38	46	6937	T. Matsumura	dummy	0	2008/2/5/18:9:0(130.34.95.43)	Ru @ 150C
5	46	48	6937	T. Matsumura	dummy	0	2008/2/5/21:54:19(172.16.44.137)	Ru @ 150C
7	21	27	6937	T. Matsumura	dummy	0	2008/2/7/10:7:22(130.34.95.43)	Ru @150C
7	36	48	6936	kawai	dummy	0	2008/2/7/18:13:33(172.16.44.137)	Ru with O2 @500C
8	0	20	6936	kawai	dummy	0	2008/2/7/18:14:8(172.16.44.137)	for cooling
8	47	48	6937	T. Matsumura	dummy	0	2008/2/9/0:21:2(172.16.44.137)	Ru @ 150C
9	0	2	6937	T. Matsumura	dummy	0	2008/2/9/0:21:33(172.16.44.137)	Ru @ 150C
15	35	43	6937	T. Matsumura	dummy	0	2008/2/15/16:11:56(130.34.95.43)	Ru @ 150
19	32	44	6937	T. Matsumura	dummy	0	2008/2/19/14:43:44(130.34.95.43)	0
19	44	48	6937	T. Matsumura	dummy	1	2008/2/19/18:33:22(130.34.95.43)	Maintenance (Chamber Bake)
20	0	20	6937	T. Matsumura	dummy	1	2008/2/19/18:34:10(130.34.95.43)	Maintenance (Chamber Bake)
20	20	28	6937	T. Matsumura	dummy	1	2008/2/20/10:51:55(172.16.44.137)	Cooling
20	28	36	6937	T. Matsumura	dummy	0	2008/2/20/10:52:17(172.16.44.137)	Ru @ 150C
22	26	34	6936	kawai	dummy	0	2008/2/22/11:42:21(130.34.95.43)	Ru with O2 for RuO2 @ 500˚C
22	34	46	6936	kawai	dummy	0	2008/2/22/18:15:47(172.16.44.137)	for cooling
25	26	36	6937	T. Matsumura	dummy	0	2008/2/25/10:17:22(130.34.95.43)	Ru @150C
25	36	40	6937	T. Matsumura	dummy	0	2008/2/25/14:18:46(130.34.95.43)	Ru @150C
25	42	48	6936	kawai	dummy	0	2008/2/25/16:47:5(130.34.95.43)	Ru with O2 for RuO2@510˚C
26	0	18	6936	kawai	dummy	0	2008/2/25/16:47:44(130.34.95.43)	for cooling
27	37	48	6937	T. Matsumura	dummy	0	2008/2/27/16:25:29(130.34.95.43)	Ru @ 300C
29	18	48	6936	kawai	dummy	1	2008/2/28/18:32:12(130.34.95.43)	Chamber cleaning