3	20	32	7122	朱小莉	dummy	0	2008/10/2/16:52:48(130.34.198.5)	FABにてCl2ガス使用
3	34	44	6909	jeong	dummy	0	2008/10/2/21:41:13(172.16.44.146)	0
7	19	33	6908	konno	dummy	0	2008/10/6/10:17:34(130.34.95.37)	Cl2、Bcl3使用
7	33	42	6909	satou	dummy	0	2008/10/6/14:19:44(130.34.95.37)	BCl3,Cl2
7	42	46	6909	satou	dummy	0	2008/10/7/18:49:58(172.16.44.145)	0
9	21	28	6909	jeong	dummy	0	2008/10/9/10:2:43(172.16.44.145)	0
10	20	32	6908	konno	dummy	0	2008/10/9/16:11:44(130.34.95.37)	Cl2、Bcl3使用
14	34	44	6909	jeong	dummy	0	2008/10/13/20:1:12(172.16.44.145)	0
16	18	32	6908	konno	dummy	0	2008/10/15/9:40:29(172.16.44.146)	Cl2、Bcl3使用
15	26	32	6908	konno	dummy	0	2008/10/15/13:24:34(172.16.44.146)	0
15	46	48	6909	s.kanno	dummy	0	2008/10/15/20:55:9(172.16.44.145)	0
16	32	40	6909	satou	dummy	0	2008/10/16/8:13:31(130.34.95.37)	0
17	36	46	6909	satou	dummy	0	2008/10/17/10:53:53(130.34.95.37)	CF4,H2   O2
17	46	48	6909	T.Konno	dummy	0	2008/10/17/21:10:40(130.34.95.37)	0
-18	0	10	6909	T.Konno	dummy	0	2008/10/17/21:11:42(130.34.95.37)	0	2008/10/17/21:13:17(130.34.95.37)
18	0	12	6909	T.Konno	dummy	0	2008/10/17/21:13:28(130.34.95.37)	0
18	34	42	6909	T.Konno	dummy	0	2008/10/18/15:44:21(172.16.44.158)	Cl2, BCl3 for Al etching
-22	18	36	6909	mm	dummy	0	2008/10/20/8:50:37(172.16.44.146)	0	2008/10/22/8:16:55(130.34.95.37)
-23	18	36	6909	mm	dummy	0	2008/10/20/8:51:3(172.16.44.146)	0	2008/10/22/15:16:58(130.34.95.37)
-24	18	36	6909	mm	dummy	0	2008/10/20/8:51:16(172.16.44.146)	0	2008/10/24/11:39:45(172.16.44.149)
21	38	48	6909	satou	dummy	0	2008/10/21/14:57:56(172.16.44.146)	O2
22	0	8	6909	satou	dummy	0	2008/10/21/14:58:11(172.16.44.146)	0
22	39	48	6909	kino	dummy	0	2008/10/21/22:54:36(172.16.44.145)	0
22	18	19	6909	mm	dummy	0	2008/10/20/8:50:37(172.16.44.146)	0
22	26	32	6908	konno	dummy	0	2008/10/22/12:15:56(172.16.44.146)	O2
22	32	39	6909	satou	dummy	0	2008/10/22/15:10:20(130.34.95.37)	0
23	36	48	6909	satou	dummy	0	2008/10/22/15:10:48(130.34.95.37)	BCl3,Cl2
-23	24	36	6909	mm	dummy	0	2008/10/22/15:17:19(130.34.95.37)	B	2008/10/22/15:17:23(130.34.95.37)
23	24	36	6909	mm	dummy	0	2008/10/22/15:17:43(130.34.95.37)	BCl3,Cl2
23	0	4	6909	kino	dummy	0	2008/10/22/20:48:8(172.16.44.146)	0
26	28	38	7122	朱	dummy	0	2008/10/23/11:17:31(130.34.198.5)	FABにてCl2ガス使用
-25	28	36	7122	沼田	dummy	0	2008/10/23/11:34:34(130.34.198.5)	FABにてCl2を使用	2008/10/23/12:49:23(130.34.198.5)
27	28	36	7122	沼田	dummy	0	2008/10/23/12:52:9(130.34.198.5)	FABにてCl2を使用
24	18	26	6909	mm	dummy	0	2008/10/20/8:51:16(172.16.44.146)	0
24	30	44	6909	mm	dummy	0	2008/10/24/11:40:15(172.16.44.149)	0
27	20	28	6965	sameshima	dummy	0	2008/10/24/16:47:13(130.34.95.31)	FABにてCl使用
-28	17	31	6908	konno	dummy	0	2008/10/27/8:22:15(130.34.95.37)	Cl2、Bcl3使用	2008/10/28/10:4:43(172.16.44.149)
-28	31	48	6909	T.Konno、Murugesan	dummy	0	2008/10/28/2:36:13(130.34.95.37)	Cl2, BCl3使用	2008/10/28/2:36:27(130.34.95.37)
28	31	48	6909	T.Konno	dummy	0	2008/10/28/2:36:44(130.34.95.37)	SiO2エッチング
-29	20	28	6965	sameshima	dummy	0	2008/10/28/9:44:4(130.34.95.31)	FABにてCl使用	2008/10/28/9:44:14(130.34.95.31)
28	17	23	6908	konno	dummy	0	2008/10/27/8:22:15(130.34.95.37)	Cl2、Bcl3使用
28	24	31	6908	konno	dummy	0	2008/10/28/10:6:28(172.16.44.149)	0
-29	16	20	6908	konno	dummy	0	2008/10/28/15:16:37(172.16.44.146)	O2	2008/10/28/16:17:48(130.34.95.37)
29	20	26	6909	mm	dummy	0	2008/10/28/15:56:55(172.16.44.149)	0
29	16	20	6909	mm	dummy	0	2008/10/28/16:19:14(130.34.95.37)	0
29	42	48	6909	T.Konno	dummy	0	2008/10/29/13:52:50(172.16.44.145)	0
30	16	26	6909	mm	dummy	0	2008/10/29/17:42:23(130.34.95.37)	0
29	32	36	6909	mm	dummy	0	2008/10/30/15:38:57(172.16.44.146)	0
-31	16	26	6909	mm	dummy	0	2008/10/30/15:39:17(172.16.44.146)	0	2008/10/31/8:8:37(130.34.95.37)
31	16	19	6909	mm	dummy	0	2008/10/30/15:39:17(172.16.44.146)	0
31	22	36	6909	mm	dummy	0	2008/10/31/8:13:21(130.34.95.37)	0